Reduction of niobium and tantalum pentoxides by silicon in vacuum

Journal of Alloys and Compounds

Volumn 315, Issue 1-2, 2001, Pages 187-192

  Awasthi, Alok ^a   Bhatt, Y J ^a   Krishnamurthy, N ^a   Ueda, Y ^b   Garg, S P ^a  

^a BHABHA ATOMIC RESEARCH CENTRE   (India)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AGENTS; EVAPORATION; NIOBIUM COMPOUNDS; PHASE DIAGRAMS; REDUCTION; SILICON; SYNTHESIS (CHEMICAL); TANTALUM COMPOUNDS; THERMODYNAMIC STABILITY; THERMOGRAVIMETRIC ANALYSIS; VACUUM APPLICATIONS; X RAY DIFFRACTION ANALYSIS;

POURBAIX-ELLINGHAM DIAGRAMS; VACUUM THERMOGRAVIMETRY;

OXIDES;

EID: 0035251942     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-8388(00)01274-3     Document Type: Article

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