SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 383, Issue 1-2, 2001, Pages 212-215

Physical properties of polycrystalline silicon films related to LPCVD conditions

(3) Modreanu, M a Bercu, M b Cobianu, C a

a NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES (Romania)

b UNIVERSITY OF BUCHAREST (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; LIGHT REFLECTION; POLYCRYSTALLINE MATERIALS; POLYSILICON; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; THERMAL EFFECTS; ULTRAVIOLET SPECTROSCOPY;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD);

SEMICONDUCTING FILMS;

EID: 0035247828 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(00)01798-3 Document Type: Article

Times cited : (13)

References (9)

1
- 0004205669
- Kluwer Academic Publishers
- Kamins T. Polycrystalline Silicon for Integrated Circuit Applications. 1988;41-64 Kluwer Academic Publishers.
- (1988) Polycrystalline Silicon for Integrated Circuit Applications , pp. 41-64
- Kamins, T.¹

2
- 0002512232
- M.D. Allendorf, Bernard C.
- Cobianu C., Cosmin P., Modreanu M., Dascalu D., Holleman J. Allendorf M.D., Bernard C. 14th Int. Conf. on Chemical Vapor Deposition and EUROCVD-11, Paris 1997. 97-25:1997;65-72.
- (1997) 14th Int. Conf. on Chemical Vapor Deposition and EUROCVD-11, Paris 1997 , vol.9725 , pp. 65-72
- Cobianu, C.¹ Cosmin, P.² Modreanu, M.³ Dascalu, D.⁴ Holleman, J.⁵

3
- 0000464096
- Dimitriadis C.A., Stoemenos J., Coxon P.A., Friligkos S., Antonopoulos J., Economou N.A. J. Appl. Phys. 73:1993;8402.
- (1993) J. Appl. Phys. , vol.73 , pp. 8402
- Dimitriadis, C.A.¹ Stoemenos, J.² Coxon, P.A.³ Friligkos, S.⁴ Antonopoulos, J.⁵ Economou, N.A.⁶

4
- 36049058200
- Cardona M., Pollak F. Phys. Rev. 142:1996;530.
- (1996) Phys. Rev. , vol.142 , pp. 530
- Cardona, M.¹ Pollak, F.²

5
- 84983814732
- Kramers B. Phys. Stat. Sol. (B). 47:1971;501.
- (1971) Phys. Stat. Sol. (B) , vol.47 , pp. 501
- Kramers, B.¹

6
- 0002916138
- Bagley B.G., Aspes D.E., Adams A.C., Mogab C.I. Appl. Phys. Lett. 38:(1):1981;56.
- (1981) Appl. Phys. Lett. , vol.38 , Issue.1 , pp. 56
- Bagley, B.G.¹ Aspes, D.E.² Adams, A.C.³ Mogab, C.I.⁴

7
- 0025385830
- Harbere G., Jastrzebski L. J. Electrochem. Soc. 137:(2):1990;696.
- (1990) J. Electrochem. Soc. , vol.137 , Issue.2 , pp. 696
- Harbere, G.¹ Jastrzebski, L.²

8
- 0343357072
- E-MRS-IUMRS ICEM (in press)
- M. Modreanu, N. Tomozeiu, M. Gartner, P. Cosmin, E-MRS-IUMRS ICEM 2000 (in press).
- (2000)
- Modreanu, M.¹ Tomozeiu, N.² Gartner, M.³ Cosmin, P.⁴

9
- 0000859415
- Petrik P., Lohner T., Fried M., Biro L.P., Khanh N.Q., Gyulai J., Lehnert W., Schneider C., Ryssel H. J. Appl. Phys. 87:2000;1734.
- (2000) J. Appl. Phys. , vol.87 , pp. 1734
- Petrik, P.¹ Lohner, T.² Fried, M.³ Biro, L.P.⁴ Khanh, N.Q.⁵ Gyulai, J.⁶ Lehnert, W.⁷ Schneider, C.⁸ Ryssel, H.⁹

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