Laser processing of amorphous silicon for large-area polysilicon imagers

Thin Solid Films

Volumn 383, Issue 1-2, 2001, Pages 137-142

  Boyce, J B ^a   Fulks, R T ^a   Ho, J ^a   Lau, R ^a   Lu, J P ^a   Mei, P ^a   Street, R A ^a   Van Schuylenbergh, K F ^a   Wang, Y ^a  

^a PALO ALTO RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CARRIER MOBILITY; EXCIMER LASERS; LEAKAGE CURRENTS; POLYSILICON; PULSED LASER APPLICATIONS; SUBSTRATES; THIN FILM TRANSISTORS;

LARGE-AREA POLYSILICON IMAGERS; NON-CRYSTALLINE SUBSTRATES;

SEMICONDUCTING FILMS;

EID: 0035247717     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01585-6     Document Type: Article

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