Optical absorption and electrical conductivity measurements of microcrystalline silicon layers grown by SiF4/H2 plasma on glass substrates

Thin Solid Films

Volumn 383, Issue 1-2, 2001, Pages 200-202

  Ambrico, M ^a   Schiavulli, L ^b   Ligonzo, T ^b   Cicala, G ^a   Capezzuto, P ^a   Bruno, G ^a  

^a CNR   (Italy)

^b Dipto Fis Unita' INFM dell'U   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY OF SOLIDS; FILM GROWTH; LIGHT ABSORPTION; PHOTOCURRENTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SUBSTRATES;

MICROCRYSTALLINE SILICON;

CONDUCTIVE FILMS;

EID: 0035247354     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01582-0     Document Type: Article

References (6)

1. Cicala G., Capezzuto P., Bruno G. Thin Solid Films. 337:1999;59.
2. Favre M., Curtins H., Vanecek M. J. Non-Cryst. Solids. 114:1989;405.
3. Vanecek M., Poruba A., Remes Z., Beck N., Nesladek M. J. Non-Cryst Solids. 227-230:1998;967.
4. Zhou J.H., Baranovsky S.D., Yamasaki S., Ikuta K., Tanaka K., Kondo M., Matsuda A., Thomas P. Phys. Stat. Sol. (B). 205:1998;147.
5. G. Bruno, M. Ambrico, G. Cicala, T. Ligonzo, M. Losurdo, L. Schiavulli, P. Capezzuto, Proc. of the 16th European Photovoltaic Solar Energy Conference, Glasgow, May 1-5, 2000. In press.
6. Losurdo M., Rizzoli R., Summonte C., Cicala G., Capezzuto P., Bruno G. J. Appl. Phys. 88:2000;2408.