Formation of hard amorphous hydrogenated carbon films with low hydrogen concentration and their erosion in air

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 2 A, 2001, Pages 788-793

  Maruyama, Kazunori ^a   Jacob, Wolfgang ^b   Roth, Joachim ^b  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

^b MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

Erosion; Hard a C:H films; Hardness; Ion beam analysis; Plasma CVD; Thermal desorption spectra

Indexed keywords

ARGON; CARBON; CHEMICAL BONDS; HEATING; HYDROGENATION; METHANE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PORE SIZE; REDUCTION; TEMPERATURE PROGRAMMED DESORPTION; THICKNESS MEASUREMENT; VICKERS HARDNESS TESTING;

AMORPHOUS HYDROGENATED CARBON; RADIO FREQUENCY PLASMA DEPOSITION;

AMORPHOUS FILMS;

EID: 0035246573     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.788     Document Type: Article

References (13)

1. Diamond and Diamond-Like Films and Coatings