Internal electric field formation in insulators under high-flux negative-ion implantation

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 2 B, 2001, Pages 1091-1093

  Amekura, Hiroshi ^a   Plaksin, Oleg A ^b   Kishimoto, Naoki ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b INSTITUTE OF PHYSICS AND POWER ENGINEERING   (Russian Federation)

Author keywords

Electric field formation; High flux; Ion implantation; Negative ion; Silica glass

Indexed keywords

DIFFUSION IN LIQUIDS; ELECTRIC FIELD EFFECTS; ELECTRODES; FUSED SILICA; HOLE MOBILITY; ION IMPLANTATION; NEGATIVE IONS;

NANOPARTICLE FORMATION;

ELECTRIC INSULATORS;

EID: 0035245546     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.1091     Document Type: Article

References (8)