Electrorheological response and structure growth of colloidal silica suspensions

Journal of Colloid and Interface Science

Volumn 234, Issue 1, 2001, Pages 19-23

  Satoh, Tomoaki ^a   Ashitaka, Tetsuo ^a   Orihara, Shinya ^a   Saimoto, Yoshihisa ^a   Konno, Mikio ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Dielectric permittivity; Electric resistivity; Electrorheology; Silica suspension; Steady shear; Sweep shear

Indexed keywords

AGGLOMERATION; ELECTRIC CONDUCTIVITY MEASUREMENT; ELECTRIC FIELDS; ELECTROCHEMISTRY; GROWTH (MATERIALS); PERMITTIVITY MEASUREMENT; RHEOLOGY; SHEAR STRESS;

ALTERNATIVE CURRENTS;

SILICA GEL;

SILICON DIOXIDE;

ARTICLE; COLLOID; CRYSTAL STRUCTURE; CRYSTALLIZATION; DIELECTRIC CONSTANT; ELECTRIC CONDUCTIVITY; ELECTRIC FIELD; PRIORITY JOURNAL; SHEAR STRESS; STRUCTURE ANALYSIS; SUSPENSION;

EID: 0035244987     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1006/jcis.2000.7277     Document Type: Article

References (23)