Influence of Al film deposition and following treatment on the high temperature isothermal oxidation behavior of a γ-TiAl-based alloy

Surface and Coatings Technology

Volumn 136, Issue 1-3, 2001, Pages 276-280

  Li, X Y ^a   Zhu, Y C ^a   Fujita, K ^a   Iwamoto, N ^a   Matsunaga, Y ^b   Nakagawa, K ^b   Taniguchi, S ^c  

^a Ion Eng Res Institute Corporation   (Japan)

^b IHI CORPORATION   (Japan)

^c OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; DEPOSITION; DIFFUSION; METALLIC FILMS; THERMOOXIDATION;

ISOTHERMAL OXIDATION;

TITANIUM ALLOYS;

CORROSION RESISTANCE; DEPOSITION; FILM; MICROSTRUCTURE; OXIDATION;

EID: 0035241912     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)01031-8     Document Type: Article

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