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Volumn , Issue , 2001, Pages 295-300

Spectroscopic ellipsometry in optical coatings manufacturing

Author keywords

Coating thickness; Optical constants; Process control; Spectroscopic ellipsometry

Indexed keywords

CLOSED LOOP CONTROL SYSTEMS; DATA ACQUISITION; ELLIPSOMETRY; FEEDBACK; MULTILAYERS; SPECTROSCOPIC ANALYSIS;

EID: 0035208550     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (4)

References (27)
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  • 10
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    • Johs, B.1
  • 13
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    • Extension of the rotating analyzer ellipsometry to generalized ellipsometry: Determination of the dielectric function tensor from uniaxial TiO2
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    • Schubert, M.1
  • 16
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    • M-44® J.A. Woollam Co., Inc. features 44 wavelengths from 410-750 nm
  • 17
    • 0006952912 scopus 로고    scopus 로고
    • M-2000 from J.A. Woollam Co., Inc. features over 500 wavelengths from 245-1,700 nm
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    • U.S. Patent number 5,872,630
  • 20
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    • Spectroscopic ellipsometry characterization of indium tin oxide film microstructure and optical constants
    • (1998) Thin Solid Films , vol.313-314 , pp. 394
    • Synowicki, R.A.1
  • 22
    • 0029755992 scopus 로고    scopus 로고
    • In situ multi-wavelength ellipsometric control of thickness and composition for Bragg reflector structures
    • (1996) MRS Proc , vol.406 , pp. 347
    • Herzinger, C.1
  • 23
    • 0006961474 scopus 로고    scopus 로고
    • U.S. Patent number 5,582,646
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    • U.S. Patent number 5,929,995
  • 25
    • 4243262229 scopus 로고    scopus 로고
    • Real-time monitoring and control of epitaxial semiconductor growth in a production environment by in situ spectroscopic ellipsometry
    • (1998) Thin Solid Films , vol.313-314 , pp. 490
    • Johs, B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.