Zone-defined growth of multicrystalline silicon film from metal-silicon solution

Solar Energy Materials and Solar Cells

Volumn 65, Issue 1, 2001, Pages 465-470

  Kita, Koji ^a   Yamatsugu, Hokuto ^a   Wen, Ching Ju ^a   Komiyama, Hiroshi ^a   Yamada, Koichi ^b  

^a UNIVERSITY OF TOKYO   (Japan)

^b SHINSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CRYSTAL GROWTH; LIQUID PHASE EPITAXY; NUCLEATION; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SOLUTIONS; SUBSTRATES; TEMPERATURE;

ALUMINUM OXIDE; METAL SILICON SOLUTION; MULTICRYSTALLINE SILICON; SOLUTION GROWTH TECHNIQUE; ZONE DEFINED GROWTH;

FILM GROWTH;

EID: 0035198339     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(00)00129-X     Document Type: Article

References (8)

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