Production technology of large-area multicrystalline silicon solar cells

Solar Energy Materials and Solar Cells

Volumn 65, Issue 1, 2001, Pages 269-275

  Fujii, Shuich ^a   Fukawa, Yuko ^a   Takahashi, Hiroaki ^a   Inomata, Yosuke ^a   Okada, Kenichi ^a   Fukui, Kenji ^a   Shirasawa, Katsuhiko ^a  

^a KYOCERA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

METALLIZING; PASSIVATION; PHOTOLITHOGRAPHY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REACTIVE ION ETCHING; SILICON NITRIDE;

FINE CONTACT GRID; LARGE SCALE PRODUCTION TECHNOLOGY; SCREENPRINTED METALLIZATION TECHNIQUE;

SILICON SOLAR CELLS;

EID: 0035194772     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(00)00102-1     Document Type: Article

References (4)

1. H. Nakata et al., Proceedings of the Seventh PVSEC, 1993, p. 91.
2. P. Fath et al., Proceedings of the 13th European PVSEC, 1995, p. 29.
3. R. Hazel, Proceedings of the 13th PVSEC, 1995, p. 115.
4. Y. Inomata et al., Proceedings of the Ninth PVSEC, 1996, p. 109.