An environmentally friendly photo resist and ashing residue remover for Cu/low-k devices

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 2001, Pages 221-224

  Koito, T ^a   Hirano, K ^a   Nakabeppu, K ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASH HANDLING; BIODEGRADATION; COPPER CORROSION; CORROSION INHIBITORS; DIELECTRIC DEVICES; ENVIRONMENTAL IMPACT; MUTAGENESIS; NITROGEN COMPOUNDS; PHOTORESISTORS;

ASHING RESIDUE REMOVER; ENVIRONMENTALLY FRIENDLY PHOTO RESISTS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0035174934     PISSN: 1523553X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)