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Volumn , Issue , 2001, Pages 69-70
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A parallel between silicon splitting kinetics study and IR absorption analysis
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Author keywords
[No Author keywords available]
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Indexed keywords
ACTIVATION ENERGY;
ANNEALING;
CHEMICAL BONDS;
DIFFUSION IN SOLIDS;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
HYDROGENATION;
ION IMPLANTATION;
SILICON WAFERS;
TRANSMISSION ELECTRON MICROSCOPY;
SILICON SPLITTING KINETICS;
SMART-CUT PROCESS;
SILICON ON INSULATOR TECHNOLOGY;
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EID: 0035172593
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (3)
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References (7)
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