Shallow trench isolation scatterometry metrology in a high volume fab

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 2001, Pages 195-198

  Lensing, Kevin R ^a   Markle, Richard J ^a   Stirton, Broc ^a   Laughery, Michael A ^b  

^a ADVANCED MICRO DEVICES   (United States)

^b A TEL Company   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PROCESS CONTROL; SIGNAL TO NOISE RATIO;

SHALLOW TRENCH ISOLATION (STI);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0035165714     PISSN: 1523553X     EISSN: None     Source Type: Journal    
DOI: 10.1109/ISSM.2001.962947     Document Type: Article

References (2)

1. The role of and future demands on metrology systems foradvanced process control
2. Data requirements and communication issues for advanced process control