High resistive ELTRAN® SOI-Epi™ wafers for RF application

IEEE International SOI Conference

Volumn , Issue , 2001, Pages 67-68

  Sato, N ^a   Nakayama, J ^a   Ohmi, K ^a   Yonehara, T ^a  

^a CANON INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AIR FILTERS; BOROSILICATE GLASS; CHEMICAL BONDS; ELECTRIC CONDUCTIVITY; EPITAXIAL GROWTH; ETCHING; FABRICATION; INTERFACES (MATERIALS); POROUS SILICON; SILICON ON INSULATOR TECHNOLOGY;

EPITAXIAL LAYER TRANSFER (ELTRAN) TECHNOLOGY;

SILICON WAFERS;

EID: 0035163486     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)