Vacancy diffusion kinetics in arsenic-rich nonstoichiometric AlAs/GaAs heterostructures

Physical Review B - Condensed Matter and Materials Physics

Volumn 63, Issue 3, 2001, Pages

  Balasubramanian, S ^a   Mansour, S W ^a   Melloch, M R ^a  

^a PURDUE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALLUMINUM ARSENIC; ALUMINUM; ARSENIC; GALLIUM; GALLIUM ARSENIC; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL STRUCTURE; CONCENTRATION (PARAMETERS); DIFFUSION; KINETICS; QUANTUM MECHANICS; STOICHIOMETRY; TEMPERATURE SENSITIVITY;

EID: 0035130938     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.63.033305     Document Type: Article

References (10)

1. M. Bockstedte and M. Scheffler, Z. Phys. Chem. (Munich), 200, 195 (1997).
2. R. Guersen, I. Lahiri, M. Dinu, M. R. Melloch, and D. D. Nolte, Phys. Rev. B, 60, 10926 (1999).
3. I. Lahiri, D. D. Nolte, J. C. P. Chang, J. M. Woodall, and M. R. Melloch, Appl. Phys. Lett., 67, 1244 (1995).
4. I. Lahiri, D. D. Nolte, E. S. Harmon, M. R. Melloch, and J. M. Woodall, Appl. Phys. Lett., 66, 2519 (1995).
5. L. Wang, L. Hsu, E. E. Haller, J. W. Erickson, A. Fischer, K. Eberl, and M. Cardona, Phys. Rev. Lett., 76, 2342 (1996).
6. D. D. Nolte and M. R. Melloch, MRS Bull., 19, 44 (1994).
7. K. Mahalingam, N. Otsuka, M. R. Melloch, J. M. Woodall, and A. C. Warren, J. Vac. Sci. Technol. B, 9, 2328 (1991).
8. D. E. Bliss, W. Walukiewicz, J. W. I. Ager, E. E. Haller, K. T. Chan, and S. Tanigawa, J. Appl. Phys., 71, 1699 (1992).
9. D. E. Bliss, W. Walukiewicz, and E. E. Haller, J. Electron. Mater., 22, 1401 (1993).
10. J. C. Bourgoin, Appl. Phys. Lett., 72, 442 (1998).