Copper film prepared with ArF excimer laser

Applied Surface Science

Volumn 169-170, Issue , 2001, Pages 493-495

  Yoshida, A ^a   Sato, H ^a   Uchida, M ^a   Wakahara, A ^a   Hoshino, A ^b   Machida, H ^b  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b TRI Chemical Laboratory Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COPPER; ELECTRIC CONDUCTIVITY; EXCIMER LASERS; PHOTOCHEMICAL REACTIONS; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTOCHEMICAL VAPOR DEPOSITION (PHOTO-CVD);

METALLIC FILMS;

EID: 0035129850     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00744-3     Document Type: Article

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