Bridging the pressure gap in surface science at the atomic level: H/Cu(110)

Physical Review Letters

Volumn 86, Issue 3, 2001, Pages 460-463

  Osterlund L ^a,b   Rasmussen, P B ^a   Thostrup, P ^a   Laegsgaard E ^a   Stensgaard, I ^a   Besenbacher, F ^a  

^a AARHUS UNIVERSITY   (Denmark)

^b CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ADSORPTION ISOTHERMS; AUGER ELECTRON SPECTROSCOPY; COPPER; LOW ENERGY ELECTRON DIFFRACTION; MOLECULAR SIEVES; PRESSURE; SCANNING TUNNELING MICROSCOPY; TEMPERATURE PROGRAMMED DESORPTION;

PRESSURE DEPENDENCE; PRESSURE GAP; SURFACE RECONSTRUCTION;

HYDROGEN;

EID: 0035127738     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.86.460     Document Type: Article

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