Influence of UV light irradiation on film thickness distribution of tin oxide films by photochemical vapour deposition

Applied Surface Science

Volumn 169-170, Issue , 2001, Pages 425-427

  Tamura, S ^a   Ishida, T ^a   Magara, H ^b   Mihara, T ^a   Mochizuki, S ^a   Tatsuta, T ^c  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b INDUSTRIAL TECHNOLOGY CENTER OF FUKUI PREFECTURE   (Japan)

^c 33 Tanakamiya cho Takeda F   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FILM PREPARATION; MERCURY VAPOR LAMPS; PHOTOCHEMICAL REACTIONS; PLASTIC FILMS; POLYTETRAFLUOROETHYLENES; TIN COMPOUNDS; ULTRAVIOLET RADIATION; VAPOR DEPOSITION;

PHOTOCHEMICAL VAPOR DEPOSITION (PHOTO-CVD); ULTRAVIOLET LIGHT IRRADIATION;

OPTICAL FILMS;

EID: 0035127436     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00697-8     Document Type: Article

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