Hexagonal boron nitride film substrate for fabrication of nanostructures

Applied Surface Science

Volumn 169-170, Issue , 2001, Pages 415-419

  Lee, K S ^a   Kim, Y S ^a   Tosa, M ^b   Kasahara, A ^b   Yosihara, K ^b  

^a Sungkyunkwan University   (South Korea)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; BORON COMPOUNDS; CRYSTAL LATTICES; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; SCANNING TUNNELING MICROSCOPY; SEGREGATION (METALLOGRAPHY); SUBSTRATES; SYNTHESIS (CHEMICAL); VAN DER WAALS FORCES; X RAY PHOTOELECTRON SPECTROSCOPY;

HEXAGONAL BORON NITRIDE;

SEMICONDUCTING FILMS;

EID: 0035126814     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00695-4     Document Type: Article

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