Remote-plasma-enhanced reaction between a silicon surface and trifluoro-acetyl-fluoride gas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 19, Issue 1, 2001, Pages 38-40

  Saito, Yoji ^a  

^a SEIKEI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FLUORINE COMPOUNDS; LIGHT EMISSION; OXIDES; OXYGEN; SILICON; SURFACE STRUCTURE; THERMAL EFFECTS;

REMOTE PLASMA ENHANCED REACTION; TRIFLUORO ACETYL FLUORIDE;

PLASMA ETCHING;

EID: 0035104985     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1326942     Document Type: Article

References (2)

1. For example, D. Harvey, J. Gregory, M. Hoffen, A. Jain, M. Lai, R. Leemans, S. Raper, T. Wigley, and J. de Wolde, "An introduction to simple climate models used in the IPCC second assessment report," edited by J. T. Houghton, G. M. Filho, D. J. Griggs, and K. Maskell, Inter-gov. Panel on Climate Change (1997).
2. Y. Saito, M. Hirabaru, and A. Yoshida, IEICE Trans. Electron. E7S-C, 834 (1992).