Molecular beam epitaxy system at an undergraduate institution

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 19, Issue 1, 2001, Pages 383-387

  Celinski, Z ^a  

^a UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; LOW ENERGY ELECTRON DIFFRACTION; MANIPULATORS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; VACUUM TECHNOLOGY;

LOADLOCK CHAMBER; MAGNETIC STRUCTURES;

MOLECULAR BEAM EPITAXY;

EID: 0035104982     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1329116     Document Type: Article

References (2)

1. Epoxy has been used for decades to make ultrahigh vacuum compatible electrical feedthroughs. See for example A. C. Anderson, Rev. Sci. Instrum. 39, 605 (1968).
2. Y. Takahira and H. Okamoto, J. Cryst. Growth 175/176, 267 (1997).