Effects of electron-beam irradiation on the properties of CN thin films deposited by direct dual ion beams

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 19, Issue 1, 2001, Pages 145-152

  Kim, Yong Hwan ^a  

^a Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NITRIDE; DEPOSITION; ELECTRON BEAMS; ELECTRON ENERGY LOSS SPECTROSCOPY; ION BEAMS; ION BOMBARDMENT; IRRADIATION; MAGNETIC FIELDS; PHOTOELECTRON SPECTROSCOPY;

CHARGE ENHANCED BONDING PROCESS; DIRECT DUAL ION BEAMS; DIRECT ION BEAM DEPOSITION; ELECTRON BEAM IRRADIATION; TRANSVERSE MAGNETIC FIELDS;

THIN FILMS;

EID: 0035104222     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1330256     Document Type: Article

References (2)

1. A. Y. Liu and M. L. Cohen, Science 245, 841 (1989).
2. S. F. Durrant, E. C. Rangel, and M. A. Bica de Moraes, J. Vac. Sci. Technol. A 13, 361 (1995).