|
|
Volumn 19, Issue 1, 2001, Pages 167-170
|
|
Influence of sputtering pressure on physical structure of AIN thin films prepared on Y-128° LiNbO3 by rf magnetron sputtering
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
ALUMINUM NITRIDE;
ATOMIC FORCE MICROSCOPY;
CRYSTAL STRUCTURE;
FILM PREPARATION;
LITHIUM NIOBATE;
MAGNETRON SPUTTERING;
MICROSTRUCTURE;
MORPHOLOGY;
PRESSURE;
X RAY DIFFRACTION ANALYSIS;
HIGH SPUTTERING PRESSURE REGION;
MICROPHORMOLOGY;
PHYSICAL STRUCTURE;
THIN FILMS;
|
|
EID: 0035104186
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1323975 Document Type: Article |
|
Times cited : (8)
|
|
References (2)
|
