|
|
Volumn 17, Issue 2, 2001, Pages 281-284
|
|
Characterization of the oxidized β-Si3N4 whisker surface layer using XPS and TOF-SIMS
a
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
AFTER-HEAT TREATMENT;
AMORPHOUS SILICON;
CRYSTAL IMPURITIES;
CRYSTAL STRUCTURE;
CRYSTALS;
SECONDARY ION MASS SPECTROMETRY;
SILICON;
SILICON COMPOUNDS;
X RAY PHOTOELECTRON SPECTROSCOPY;
AMORPHOUS LAYER;
AMORPHOUS REGIONS;
CRYSTAL LAYER;
GRADIENT INTERFACES;
IMPURITY ELEMENT;
IN COMPOSITIONS;
OUTER SURFACE;
SURFACE LAYERS;
OXIDATION;
NITROGEN DERIVATIVE;
SILICON DERIVATIVE;
ANALYTIC METHOD;
ARTICLE;
CHEMICAL ANALYSIS;
CHEMICAL BOND;
CHEMICAL COMPOSITION;
MASS SPECTROMETRY;
OXIDATION;
X RAY SPECTROMETRY;
|
|
EID: 0035095592
PISSN: 09106340
EISSN: None
Source Type: Journal
DOI: 10.2116/analsci.17.281 Document Type: Article |
|
Times cited : (8)
|
|
References (11)
|
