Microstructural analysis of silicon carbide monofilaments

Journal of Microscopy

Volumn 201, Issue 2, 2001, Pages 179-188

  Shatwell, R A ^a,b   Dyos, K L ^a   Prentice, C ^a   Ward, Y ^a   Young, R J ^a  

^a DEFENCE SCIENCE AND TECHNOLOGY LABORATORY   (United Kingdom)

^b UNIVERSITY OF MANCHESTER   (United Kingdom)

Author keywords

DERA Sigma; Fibre; Microstructure; Monofilament; Raman; SiC; Thermal analysis; Transmission electron microscopy

Indexed keywords

AMORPHOUS SILICON; DIFFERENTIAL SCANNING CALORIMETRY; ELECTRON PROBE MICROANALYSIS; ELECTRONS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MICROSTRUCTURE; RAMAN SCATTERING; SILICA; SILICON OXIDES; STACKING FAULTS; THERMOGRAVIMETRIC ANALYSIS; X RAY DIFFRACTION;

DERA SIGMA; ELECTRON-MICROPROBE ANALYSIS; MICROSTRUCTURAL ANALYSIS; MONOFILAMENT; PROCESS PROPERTIES; RAMAN; RAMAN MICROPROBE ANALYSIS; RAMAN TECHNIQUES; TEXTRON; THERMO GRAVIMETRIC ANALYSIS;

SILICON CARBIDE;

CARBON MONOXIDE; SILICON CARBIDE;

ARTICLE; CRYSTAL; CRYSTAL STRUCTURE; DIFFERENTIAL SCANNING CALORIMETRY; ELECTRON PROBE MICROANALYSIS; OPTICS; POLARIZATION; PRIORITY JOURNAL; RAMAN SPECTROMETRY; STRUCTURE ANALYSIS; TECHNIQUE; THERMAL ANALYSIS; THERMOGRAVIMETRY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

EID: 0035089456     PISSN: 00222720     EISSN: None     Source Type: Journal    
DOI: 10.1046/j.1365-2818.2001.00836.x     Document Type: Article

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