Kinematical two-dimensional multiple-diffraction intensity profiles. Application to ω-ψ scans of silicon and diamond obtained with synchrotron radiation

Journal of Applied Crystallography

Volumn 34, Issue 2, 2001, Pages 157-165

  Rossmanith, E ^a   Hupe, A ^a   Kurtz, R ^a   Schmidt, H ^a   Krane, H G ^b  

^a UNIVERSITY OF HAMBURG   (Germany)

^b UNIVERSITY OF BONN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DIAMOND; SILICON;

ARTICLE; CALCULATION; CRYSTAL STRUCTURE; DIFFRACTION; SYNCHROTRON; THEORY;

EID: 0035066408     PISSN: 00218898     EISSN: None     Source Type: Journal    
DOI: 10.1107/S0021889801001352     Document Type: Article

References (9)

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4. Rossmanith, E. (1992). Acta Cryst. A48, 596-610.
5. Rossmanith, E. (1993). Acta Cryst. A49, 80-91.
6. Rossmanith, E. (1999). J. Appl. Cryst. 32, 355-361.
7. Rossmanith, E. (2000a). J. Appl. Cryst. 33, 323-329.
8. Rossmanith, E. (2000b). J. Appl. Cryst. 33, 921-927.
9. Rossmanith, E. (2000c). J. Appl. Cryst. 33, 1405-1414.