Formation of radiation defects in high-purity silicate glasses in dependence on dopants and UV radiation sources;Defektbildung in hochreinen silicatgläsern in abhängigkeit von glaszusammensetzung und UV-strahlungsquellen

Glass Science and Technology: Glastechnische Berichte

Volumn 74, Issue 2, 2000, Pages 23-31

  Natura, U ^a   Ehrt, D ^a   Naumann, K ^a  

^a Schott Lithotec AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AGENTS; COMPOSITION EFFECTS; DEFECTS; DOPING (ADDITIVES); EXCIMER LASERS; IMPURITIES; LIGHT ABSORPTION; MATHEMATICAL MODELS; RADIATION EFFECTS; RADIATION PROTECTION; SILICATES; ULTRAVIOLET RADIATION;

DEFECT GENERATION; RADIATION DEFECTS; RADIATION RESISTANCE; RADIATION SOURCES; SILICATE GLASSES; SOLARIZATION;

GLASS;

EID: 0035050089     PISSN: 09467475     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (9)

1. UV transmission and radiation-induced defects in phosphate and fluoride-phosphate glasses
2. Formation of radiation defects in silicate and borosilicate glasses caused by UV lamp and excimer laser radiation
3. Structure, properties and applications of borate glasses
4. Properties and mechanism of solarization in as-doped soda-lime-silica glasses with ultraviolet radiation
5. Kinetics of UV laser radiation defects in high performance glasses
6. UV-strahlungsinduzierte Defektbildung und -rückbildung in Gläsern
7. Generation and healing behavior of radiation induced optical absorption in fluoride phosphate glasses: The dependence on UV radiation sources and temperature
8. Modeling of excimer laser radiation induced defect generation in fluoride phosphate glasses
9. Theoretical treatment of the kinetics of diffusion-limited reaction