AFM, SEM, EDX and HRTEM study of the crystalline growth rate anisotropy-induced internal stress and surface roughness of YBaCuO thin film

Materials Characterization

Volumn 46, Issue 1, 2001, Pages 55-63

  Pailloux, F ^a   Gaboriaud, R J ^a   Champeaux, C ^b   Catherinot, A ^b  

^a UNIVERSITÉ DE POITIERS   (France)

^b UNIVERSITY OF LIMOGES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ATOMIC FORCE MICROSCOPY; CRYSTAL GROWTH; ELECTRON DIFFRACTION; ENERGY DISPERSIVE SPECTROSCOPY; HIGH RESOLUTION ELECTRON MICROSCOPY; OXIDE SUPERCONDUCTORS; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY; YTTRIUM BARIUM COPPER OXIDES;

LARGE ANGLE CONVERGENT BEAM ELECTRON DIFFRACTION (LACBED);

SUPERCONDUCTING FILMS;

EID: 0035023051     PISSN: 10445803     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1044-5803(00)00094-2     Document Type: Article

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