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Volumn 72, Issue 4, 2001, Pages 443-446
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Atomistic processes and the strain distribution in the early stages of thin film growth
a b,c c,d a c d b |
Author keywords
[No Author keywords available]
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Indexed keywords
COPPER;
DIFFUSION;
FILM GROWTH;
INTERFACES (MATERIALS);
NUMERICAL METHODS;
STRAIN;
SURFACES;
ATOMISTIC PROCESSES;
STRAIN DISTRIBUTION;
STRUCTURAL RELAXATION;
THIN FILMS;
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EID: 0034970174
PISSN: 09478396
EISSN: None
Source Type: Journal
DOI: 10.1007/s003390100580 Document Type: Article |
Times cited : (7)
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References (17)
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