Iron-dependent oxidative stress in Chlorella vulgaris

Plant Science

Volumn 161, Issue 1, 2001, Pages 9-17

  Estevez, Maria Susana ^a   Malanga, Gabriela ^a   Puntarulo, Susana ^a  

^a UNIVERSIDAD DE BUENOS AIRES   (Argentina)

Author keywords

Antioxidants; Ascorbyl radical; Chlorella vulgaris; Iron; Lipid radicais; UV B radiation

Indexed keywords

BIOLOGICAL MEMBRANES; CELL CULTURE; IRON; LIPIDS; MORPHOLOGY; PARAMAGNETIC RESONANCE; STARCH; ULTRAVIOLET RADIATION;

OXIDATIVE STRESS;

CATALYSTS;

ALPHA TOCOPHEROL; ASCORBIC ACID; BETA CAROTENE; IRON; LIPID; RADICAL; STARCH; THIOL;

ARTICLE; CATALYST; CELL GROWTH; CELL STRUCTURE; CHLORELLA VULGARIS; ELECTRON SPIN RESONANCE; GROWTH RATE; MEMBRANE; MODEL; NONHUMAN; OXIDATIVE STRESS; PHYTOPLANKTON; PLANT GROWTH; RADIATION EXPOSURE; RIBOSOME;

CHLORELLA VULGARIS;

EID: 0034967598     PISSN: 01689452     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-9452(01)00364-8     Document Type: Article

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