Poloidally asymmetric plasma response with ECH deposition near q = 1 in TCV

Fusion Engineering and Design

Volumn 53, Issue 1-4, 2001, Pages 241-248

  Henderson, M A ^a   Goodman, T P ^a   Hogge, J Ph ^a   Pietrzyk, Z A ^a   Pochelon, A ^a   Sauter, O ^a  

^a EPFL   (Switzerland)

Author keywords

ECCD; Plasma; Sawtooth

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; ELECTRON EMISSION; MAGNETIC FIELD EFFECTS;

ELECTRON CYCLOTRON CURRENT DRIVES (ECCD);

TOKAMAK DEVICES;

EID: 0034962847     PISSN: 09203796     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0920-3796(00)00493-2     Document Type: Article

References (13)

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