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Bulletin of the Chemical Society of Japan

Volumn 74, Issue 5, 2001, Pages 991-996

A novel photosensitive silicone ladder polymer: Synthesis, photochemical, and thermal characteristics

(6) Yasuda, Naoki a Yamamoto, Shigeyuki a Adachi, Hiroshi a Nagae, Suguru b Wada, Yuji b Yanagida, Shozo a,b

a MITSUBISHI ELECTRIC CORPORATION (Japan)

b OSAKA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOCROSSLINKER;

COPOLYMERIZATION; ORGANIC SOLVENTS; PERMITTIVITY; POLYMERS; POTASSIUM COMPOUNDS; SOLUBILITY; THERMODYNAMIC STABILITY; TRANSPARENCY; XYLENE;

PHOTOSENSITIVITY;

POLYMER; SILICONE;

ARTICLE; PHOTOCHEMISTRY; PHOTOSENSITIVITY; SYNTHESIS; THERMAL ANALYSIS;

EID: 0034951015 PISSN: 00092673 EISSN: None Source Type: Journal
DOI: 10.1246/bcsj.74.991 Document Type: Article

Times cited : (7)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.