Strategies for wafer-scale hot embossing lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4349, Issue , 2001, Pages 86-89

  Scheer, H C ^a   Schulz, H ^a   Lyebyedyev, D ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FILLING; FLOW INTERACTIONS; MASKS; POLYMERS; STAMPING; VISCOELASTICITY; WSI CIRCUITS;

HOT EMBOSSING LITHOGRAPHY (HEL);

LITHOGRAPHY;

EID: 0034934639     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.425080     Document Type: Conference Paper

References (7)

1. Replication techniques for diffractive optical elements
2. Problems of the nanoimprint technique for nanometer scale pattern definition
3. A contribution to the flow behaviour of thin polymer films during hot embossing
4. Flow behaviour of thin polymer films used for hot embossing lithography
5. Process development for nanoimprint lithography
6. Multistep profiles by mix and match of nanoimprint and UV lithography
7. New polymer materials for nanoimprinting