Optical measurements of strain and stress in thin films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4413, Issue , 2001, Pages 242-247

  Tamulevicius S ^a   Augulis, L ^a   Laukaitis, G ^a  

^a KAUNAS UNIVERSITY OF TECHNOLOGY   (Lithuania)

Author keywords

Electronic speckle pattern interferometer; Laser interferometer; Strain; Stress; Thin film

Indexed keywords

DEPOSITION; INTERFEROMETERS; MULTILAYERS; SPECKLE; STRAIN MEASUREMENT; STRESS ANALYSIS;

SPECKLE PATTERN INTERFEROMETERS;

THIN FILMS;

EID: 0034929051     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.425439     Document Type: Conference Paper

References (14)

1. Mechanical properties of non-metallic thin films
2. Stress analysis of transistor considering the internal stress of thin films
3. Stress and strain in the vacuum deposited thin films
4. Techniques for measurements of strain in thin films
5. A laser interferometer system to monitor dry etching of patterned silicon
6. Application of laser interferometer systems for the study of ion interaction with solids
7. Laser reflective interferometry for in-situ monitoring of diamond film growth by chemical vapor deposition
8. Mechanical stresses in titanium oxide coating
9. Stress and surface studies of SILAR grown CdS thin films on GaAs(100)
10. 1-xS thin films
11. Development of surface topology during ion sputtering of silicon
12. Medžiagotyra (Material Science)
13. Medžiagotyra (Material Science)
14. Optimization of the correlation method in electronic speckle pattern interferometry