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Volumn 42, Issue 7, 2001, Pages 784-787

Development of UV defense mechanisms during growth of spinach seedlings

Author keywords

Cyclobutane pyrimidine dimer; DNA photolyase (EC 4.1.99.3); Spinach; UV absorbing substance

Indexed keywords

ABSORPTION; DEFENSE MECHANISM; DEOXYRIBODIPYRIMIDINE PHOTOLYASE; DNA REPAIR; ENZYME ACTIVITY; PLANT GROWTH; SEEDLING; SPINACH; ULTRAVIOLET RADIATION; WHITE LIGHT;

EID: 0034922098     PISSN: 00320781     EISSN: None     Source Type: Journal    
DOI: 10.1093/pcp/pce100     Document Type: Article
Times cited : (13)

References (25)
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  • 14
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    • Naito, K.1    Tsuji, H.2    Hatakeyama, I.3
  • 17
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    • UV-B-inducible and temperature sensitive photoreactivation of cyclobutane pyrimidine dimers in Arabidopsis thaliana
    • (1991) Plant Physiol. , vol.95 , pp. 536-543
    • Pang, Q.1    Hays, J.2
  • 19
    • 0028606403 scopus 로고
    • Mechanisms of DNA excision repair
    • (1994) Science , vol.266 , pp. 1954-1956
    • Sancar, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.