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Fullerene Science and Technology

Volumn 9, Issue 2, 2001, Pages 241-246

C60 decomposition on some transition metal and semiconductor surfaces

(3) Gall, N R a Rut'kov, E V a Tontegode, A Y a

a IOFFE INSTITUTE (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; DECOMPOSITION; DESORPTION; FILM GROWTH; MOLECULAR DYNAMICS; SEMICONDUCTOR MATERIALS; SURFACE CHEMISTRY; TEMPERATURE PROGRAMMED DESORPTION; THERMAL EFFECTS; TRANSITION METALS;

FULLERENE SURFACE INTERACTION; HIGH RESOLUTION AUGER ELECTRON SPECTROSCOPY; SEMICONDUCTOR SURFACES; THERMAL DESORPTION MASS SPECTROSCOPY; THERMAL TRANSFORMATION;

FULLERENES;

EID: 0034919140 PISSN: 1064122X EISSN: None Source Type: Journal
DOI: 10.1081/FST-100102971 Document Type: Article

Times cited : (3)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.