Effects of Cr, Y and Nb ion implantation on oxidation behavior of γ-TiAl at 1000°C

He Jishu/Nuclear Techniques

Volumn 24, Issue 1, 2001, Pages 27-

  Zhu, X P ^a   Lei, M K ^a   Ma, T C ^a   Tang, Z L ^a   Wang, F H ^a  

^a NONE

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EID: 0034897384     PISSN: 02533219     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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