Measurement of the friction of thin films by means of a quartz microbalance in the presence of a finite vapor pressure

Physical Review B - Condensed Matter and Materials Physics

Volumn 63, Issue 23, 2001, Pages

  Bruschi, L ^a   Mistura, G ^a  

^a UNIVERSITY OF PADOVA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON DIOXIDE;

ACOUSTIC IMPEDANCE; ARTICLE; CALIBRATION; CRYSTAL; FILM; FRICTION; LOW TEMPERATURE PROCEDURES; MATHEMATICAL ANALYSIS; MEASUREMENT; PRESSURE; VAPOR; VISCOSITY;

EID: 0034895217     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.63.235411     Document Type: Article

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