Effects of doping elements on oxidation properties of low-activation vanadium alloys

Materials Transactions

Volumn 42, Issue 6, 2001, Pages 1048-1051

  Fujiwara, M ^a   Natesan, K ^a   Satou, M ^a   Hasegawa, A ^a   Abe, K ^a   Takahashi, T ^a   Sugawara, T ^a   Shishido, T ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Fusion reactor materials; Low activation materials; Mechanical properties; Oxidation; Vanadium alloys

Indexed keywords

DOPING (ADDITIVES); FUSION REACTORS; HELIUM; HIGH TEMPERATURE EFFECTS; OXIDATION; OXIDATION RESISTANCE; PRESSURE EFFECTS; TENSILE STRESS; THERMOGRAVIMETRIC ANALYSIS;

LOW ACTIVATION MATERIALS;

VANADIUM ALLOYS;

EID: 0034879981     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.42.1048     Document Type: Article

References (13)