Electron beam lithography and reactive ion etching of nanometer size features in niobium films

Materials Science and Engineering C

Volumn 15, Issue 1-2, 2001, Pages 171-173

  Piotrowski, T T ^a   Piotrowska, A ^a   Kaminska E ^a   Szopniewski, Z ^a   Kolenik, S ^b   Wrobel J ^b   Gierlowski, P ^b   Lewandowski, S ^b  

^a ukasiewicz Research Network Institute of Microelectronics and Photonics   (Poland)

^b INSTITUTE OF PHYSICS   (Poland)

Author keywords

Electron beam based nanopatterning; Reactive ion etching; Superconducting films

Indexed keywords

ANISOTROPY; ELECTRON BEAM LITHOGRAPHY; FABRICATION; NANOSTRUCTURED MATERIALS; REACTIVE ION ETCHING; THIN FILMS;

VORTEX LATTICES;

NIOBIUM;

FILM;

EID: 0034857202     PISSN: 09284931     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0928-4931(01)00256-9     Document Type: Article

References (9)