Fundamental studies of dissolution inhibition in poly(norbornene-alt-maleic anhydride) based resins

Radiation Physics and Chemistry

Volumn 62, Issue 1, 2001, Pages 69-76

  Houlihan, F M ^a   Dabbagh, G ^a   Rushkin, I ^a   Hutton, R ^a   Bolan, K ^a   Reichmanis, E ^a   Nalamasu, O ^a   Yan, Z ^b   Reiser, A ^b  

^a LUCENT TECHNOLOGIES   (United States)

^b POLYTECHNIC UNIVERSITY   (United States)

Author keywords

193 nm resist; Dissolution inhibition; Photoacid generators

Indexed keywords

CARBOXYLIC ACIDS; HYDROPHOBICITY; RESINS; TERPOLYMERS;

INHIBITORS;

DISSOLUTION;

BIS(TERT BUTYLPHENYL)IODONIUM PERFLUOROBENZENESULFONIC ACID; BIS(TERT BUTYLPHENYL)IODONIUM PERFLUOROOCTANESULFONIC ACID; BIS(TERT BUTYLPHENYL)IODONIUM TETRAFLUOROBORIC ACID; BIS(TERT BUTYLPHENYL)IODONIUM TRESYLATE; BIS(TERT BUTYLPHENYL)IODONIUM TRIFLATE; BIS(TERT BUTYPHENYL)IODONIUM NONAFLATE; CARBOXYLIC ACID DERIVATIVE; CATION; CHOLIC ACID DERIVATIVE; DIMER; PHOTOACID; POLY(NORBORNENE ALT MALEIC ANHYDRIDE CO ACRYLIC ACID); RESIN; TERT BUTYL 1,3 CYCLOHEXANEDICARBOXYLIC ACID; TERT BUTYL 1,3,5 CYCLOHEXANETRICARBOXYLIC ACID; TERT BUTYL 1,4 CYCLOHEXANEDICARBOXYLIC ACID; TERT BUTYL ADAMANTANECARBOXYLIC ACID; TERT BUTYL CHENODEOXYCHOLIC ACID; TERT BUTYL CHOLIC ACID; TERT BUTYL CHOLIC ACID GLUTARIC ACID; TERT BUTYL DEOXYCHOLIC ACID; TERT BUTYL LITHOCHOLIC ACID; TERT BUTYL LITHOCHOLIC ACID GLUTARIC ACID; TERT BUTYLCARBOXYLIC ACID; TRIS(TERT BUTYLPHENYL)SULFONIUM NONAFLATE; TRIS(TERT BUTYLPHENYL)SULFONIUM PERFLUOROBENZENESULFONIC ACID; TRIS(TERT BUTYLPHENYL)SULFONIUM PERFLUOROOCTANESULFONIC ACID; TRIS(TERT BUTYLPHENYL)SULFONIUM TETRAFLUOROBORIC ACID; TRIS(TERT BUTYLPHENYL)SULFONIUM TRIFLATE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL REACTION; CHEMICAL STRUCTURE; COMPARATIVE STUDY; DISSOLUTION; HYDROPHOBICITY; LYSIS;

EID: 0034851807     PISSN: 0969806X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0969-806X(01)00414-5     Document Type: Article

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