Development of SiNx LPCVD processes for microtechnological applications

Journal De Physique. IV : JP

Volumn 11, Issue 3, 2001, Pages

  Rousset, B ^a   Furgal, L ^a   Fadel, P ^a   Fulop, A ^a   Pujos, D ^a   Temple Boyer, P ^a  

^a LAAS CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; MICROELECTROMECHANICAL DEVICES; REFRACTIVE INDEX; RESIDUAL STRESSES; SILICON NITRIDE; STOICHIOMETRY;

LOW-PRESSURE CHEMICAL VAPOUR DEPOSITION (LPCVD);

SEMICONDUCTING FILMS;

EID: 0034848688     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:20013117     Document Type: Conference Paper

References (15)