Control and reduction of post-metal etch corrosion effects due to airborne molecular contamination

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4406, Issue , 2001, Pages 191-199

  Morilla, C ^a   Prieto, P ^a   Barbado, F ^a  

^a Agere Systems   (Spain)

Author keywords

Corrosion; Environmental contamination; In line monitoring

Indexed keywords

CHLORINE; CHROMATOGRAPHIC ANALYSIS; CONTAMINATION; CORROSIVE EFFECTS; DEFECTS; ENERGY DISPERSIVE SPECTROSCOPY; ETCHING; SCANNING ELECTRON MICROSCOPY; X RAY ANALYSIS;

IONIC CONTAMINATION;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0034845685     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.425266     Document Type: Article

References (7)

1. The effect of Thickness on the Corrosion Susceptibility of Al Thin-film metallizations
2. The assessment of micro-analytical techniques to the semiconductor manufacturing environment
3. Quantifying aluminum post-etch tresatments