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Volumn 13, Issue 6, 2001, Pages 2078-2083
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Effects of stacking fault defects on the X-ray diffraction patterns of T2, O2, and O6 structure Li2/3[CoxNi1/3-xMn2/3]O 2
a
a
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Author keywords
[No Author keywords available]
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Indexed keywords
LITHIUM DERIVATIVE;
MANGANESE DERIVATIVE;
NICKEL COMPLEX;
OXYGEN DERIVATIVE;
ARTICLE;
CALCULATION;
CHEMICAL STRUCTURE;
ION EXCHANGE;
LOW TEMPERATURE;
MOLECULAR MODEL;
SIMULATION;
X RAY DIFFRACTION;
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EID: 0034839670
PISSN: 08974756
EISSN: None
Source Type: Journal
DOI: 10.1021/cm000885d Document Type: Article |
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Times cited : (43)
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References (13)
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