Sepiolite-PAN intercalation used as Si3N4 forming precursor

Journal of Materials Science

Volumn 36, Issue 4, 2001, Pages 957-962

  Kurt, Ali O ^a,b   Davies, Tom J ^a  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

^b MUGLA SITKI KOCMAN UNIVERSITY   (Turkey)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; GRAIN SIZE AND SHAPE; HIGH TEMPERATURE EFFECTS; HOT ISOSTATIC PRESSING; MOLECULAR STRUCTURE; MORPHOLOGY; POLYACRYLONITRILES; POLYMERIZATION; POWDERS; PYROLYSIS; REDUCTION;

CARBOTHERMAL REDUCTION NITRIDATION (CRN); SEPIOLITE;

SILICON NITRIDE;

EID: 0034831548     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1004823823130     Document Type: Article

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