Hardness of titanium carbide films deposited on silicon by pulsed laser ablation

Journal of Materials Science

Volumn 36, Issue 4, 2001, Pages 929-935

  De Maria, G ^a   Ferro, D ^a   D'Alessio, L ^b   Teghil, R ^b   Barinov, S M ^c  

^a CNR   (Italy)

^b UNIVERSITY OF BASILICATA   (Italy)

^c RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

HARDNESS TESTING; INDENTATION; LASER ABLATION; MICROHARDNESS; SILICON; TITANIUM CARBIDE;

PULSED LASER ABLATION DEPOSITION (PLAD); PULSED LASER DEPOSITION;

CERAMIC COATINGS;

EID: 0034826093     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1004811504475     Document Type: Article

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