Self-assembled monolayers as high-resolution etch masks and templates for organic molecular assembly

Materials Research Society Symposium - Proceedings

Volumn 636, Issue , 2001, Pages

  Harnett, C K ^a   Lopez, A G ^a   Satyalakshmi, K M ^a   Chen, Y F ^a   Craighead, H G ^a  

^a Cornell University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTRON BEAM LITHOGRAPHY; MASKS; NANOSTRUCTURED MATERIALS; OPTICAL SYSTEMS; PHOTORESISTS; PLASMA ETCHING; SELF ASSEMBLY; ULTRATHIN FILMS;

ELECTRON BEAM PATTERNING; ORGANIC MOLECULAR ASSEMBLY;

MONOLAYERS;

EID: 0034825399     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)