Structural characterization of titanium silicon carbide reaction

Microelectronic Engineering

Volumn 55, Issue 1-4, 2001, Pages 375-381

  Makhtari, A ^a,c   La Via, F ^b   Raineri, V ^b   Calcagno, L ^a   Frisina, F ^c  

^a INFM   (Italy)

^b CNR IMETEM   (Italy)

^c STMICROELECTRONICS   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL ORIENTATION; INTERFACES (MATERIALS); RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON CARBIDE; SUBSTRATES; THIN FILMS; TITANIUM CARBIDE; X RAY DIFFRACTION ANALYSIS;

SHEET RESISTANCE;

METALLIC FILMS;

EID: 0034825191     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00470-6     Document Type: Article

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