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Volumn 46 II, Issue , 2001, Pages 2312-2320

NF3 plasma treatment of IM7/5260 for the improvement of moisture resistance

Author keywords

Differential charging; NF3, plasma treatment; X ray photoelectron Spectroscopy

Indexed keywords

MOISTURE CONTROL; NITROGEN COMPOUNDS; PLASMA APPLICATIONS; SHEAR STRENGTH; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0034820102     PISSN: 08910138     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (1)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.